M06800 - SEMI M68 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD StdPbc-0310 orgで入手可能となる。初版は1996年に発行，前版は2005年3月に発行された。

orgで入手可能となる。初版は1996年に発行，前版は2005年3月に発行された。

SEMI D19 — Test Method for Chemical Resistance of FPD Color Filter

older LSI generations are included as well

they do not sufficiently deal with real world mixed colors for viewing angle

M06800 - SEMI M68 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD StdPbc-0310 orgで入手可能となる。初版は1996年に発行，前版は2005年3月に発行された。Wafer near edge geometry can significantly affect the yield of semiconductor device processing. Knowledge of near edge geometrical properties can help the producer and consumer determine if the dimensional characteristics of a specimen wafer satisfy given geometrical requirements. The metric, ZDD, quantifies the near edge curvature of wafers used in semiconductor device processing. Consideration should be given to the use of this or other proposed