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1-1104 (Reapproved 0618)
or surface ion contamination monitoring
it is left to the user to ensure that the actual pattern conforms to this specification
This Test Method does cover the particular factors (e
M04900 - SEMI M49 - 130 nmから65 nmへの技術世代のシリコンウェーハ用ジオメトリ測定システム規定のためのガイド Revision:SEMI M49-0613 - Superseded 1-1104 (Reapproved 0618)International Technology Roadmap for Semiconductors 1999 edition ITRS1309065 nmSEMI M1SEMI M8SEMI M11SEMI M24SEMI M38 Referenced SEMI Standards SEMI E1. 9 Mechanical Specification for Cassettes Used to Transport and Store 300 mm WafersSEMI E5 Specification for SEMI Equipment Communications Standard 2 Message Content (SECS II)SEMI E10 Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM) and