P03900 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0308 - Superseded previously published March 2010

previously published March 2010

org in July 2006

試験パラメータは製造業者とユーザで合意しておかなければならない。

• Epitaxial wafers with buried layer (refer to SEMI M61)

P03900 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0308 - Superseded previously published March 2010The purpose of this Specification is to define an interchange and encapsulation format for hierarchical integrated circuit mask layout information. Background In the fall of 2001, SEMIs Data Path Task Force formed a working group to define a successor to the venerable GDSII Stream format, which had served the I. C. industry as a de facto standard for layout interchange for more than two decades. The old format, limited by 16 bit and 32 bit internal