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or map arrays on the front or back surface of a patterned or unpatterned wafer
SEMI E123-0703 (designation update)
The purpose of this Document is to provide a standardized method to quantify the accuracy
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M05500 - SEMI M55 - Specification for Polished Monocrystalline Silicon Carbide Wafers Revision:SEMI M55-0817 - Superseded or map arrays on theThese specifications cover substrate requirements for monocrystalline high purity silicon carbide wafers of crystallographic polytype 6H and 4H used in semiconductor and electronic device manufacturing. A complete purchase specification may require the defining of additional physical, electrical, and bulk properties. These properties are listed, together with test methods suitable for determining their magnitude where such procedures are documented.
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